• ȸ»ç¼Ò°³
    • Àλ縻
    • ÀϹÝÇöȲ
    • Á¶Á÷µµ
    • ¿¬Çõ
    • ÁÖ¿ä½ÇÀû
    • À§Ä¡¾È³»
  • ½Ã½ºÅÛ¼Ò°³
    • °øÀåÀÚµ¿È­
  • Á¦Ç°¼Ò°³
    • °øÀåÀÚµ¿È­
  • ÄÁ¼³ÆÃ
    • MES
    • CIM
    • POP
  • °í°´Áö¿ø
    • °í°´Áö¿ø
  • ä¿ë¾È³»
    • ä¿ë¾È³»

½Ã½ºÅÛ¼Ò°³

  • °øÀåÀÚµ¿È­
  • CIM
  • IN-LINE CIM
  • MES
  • ECC
  • WMS
  • PCÁ¦¾î
  • PLCÁ¦¾î
  • HMI/MMI/Gateway
 
  Á¦Ç°¼³°è ±â´É
Á¦Ç°À» ¼³°èÇϱâ À§ÇÏ¿©¼­´Â Á¦Ç°À» ±¸¼ºÇÏ´Â ¸ðµç ǰ¸ñ¿¡ ´ëÇÑ ¼³°è¸¦ ÇÏ¿©¾ß ÇÑ´Ù. »Ó¸¸ ¾Æ´Ï¶ó, Á¦Ç°ÀÇ »ý»ê¿¡ ÇÊ¿äÇÑ °ø±¸³ª °íÁ¤±¸µµ ¼³°èÇÏ¿©¾ß ÇÑ´Ù. ¼³°è±â´É¿¡¼­´Â ÀÌ¿Í °ü·ÃµÈ ±âº»¼³°è, °øÇÐÀûºÐ¼®, »ó¼¼¼³°è µîÀ» ¼öÇàÇÑ´Ù. À̰ÍÀ» Áö¿øÇϱâ À§ÇÏ¿© CAD¸¦ ÀÌ¿ëÇÑ´Ù.
  »ý»ê ±â´É
»ý»ê±â´É¿¡¼­´Â, °¡°øÀ̳ª Á¶¸³À» ºñ·ÔÇÏ¿©, »ý»ê¿¡ ÇÊ¿äÇÑ ±â´ÉÀ» ¼öÇàÇÑ´Ù. °¡°øÀ» À§ÇÏ¿©, NC ÇÁ·Î±×·¥°ú °°Àº ÀÚµ¿»ý»êÀ» À§ÇÑ °¡°ø ÇÁ·Î±×·¥À» ÀÛ¼ºÇϰí, ÀÚµ¿Ã¢°í¸¦ ºñ·ÔÇÑ ÀÚÀçÀÇ º¸°üÀ̳ª ÀÚÀçÀÇ È帧À» Á¦¾îÇÏ´Â ÇÁ·Î±×·¥µµ ÀÛ¼ºÇÑ´Ù. ¶ÇÇÑ, °¢Á¾ ÀÚµ¿ÀåºñÀÇ °¡°ø, Á¶¸³, ¿î¹Ý¿¡ ´ëÇÑ ¿î¿µ ¹× º¸Á¸±â¼ú°ú Á¦Ç°ÀÇ Ç°ÁúÀ» º¸ÁõÇϱâ À§ÇÑ °Ë»ç ¹× ÃøÁ¤±â¼úµµ ÀÖ´Ù. GT¸¦ ºñ·ÔÇÏ¿© FMS, PC, CNC, ·Îº¿À» Æ÷ÇÔÇÑ CAMÀÌ »ý»ê±â´ÉÀÇ ÁÖ¿ä ±â¼úÀÌ µÈ´Ù.
  °èȹ ¹× °ü¸® ±â´É
°èȹ ¹× °ü¸®±â´ÉÀ¸·Î´Â, Á¦Ç°ÀÇ »ý»êÀ» À§ÇÑ °øÁ¤°èȹ, »ý»ê´É·Â°èȹ, ÀÚÀç¼Ò¿ä°èȹ, ÀÏÁ¤°èȹ, »ý»êÇöÀå ½Ã¹Ä·¹ÀÌ¼Ç µîÀ» ºñ·ÔÇÏ¿© ÀÛ¾÷Ç¥Áؼ³Á¤, ±¸¸Å°ü¸®, Àç°í°ü¸®, ǰÁú°ü¸®, ºÎÇϰü¸® µîÀÌ ÀÖ´Ù. CAPP¸¦ ºñ·ÔÇÏ¿©, MRP, JIT OPT(Optimized Production Technology) µî °¢Á¾ »ý»ê°èȹ ¹× °ü¸®±â¹ýµéÀÌ ÁַΠȰ¿ëµÈ´Ù.
  Á¤º¸°ü¸® ±â´É
Á¤º¸°ü¸® ±â´É¿¡´Â, µ¥ÀÌÅͺ£À̽ºÀÇ ±¸Ãà ¹× À¯Áö, ÄÄÇ»ÅÍ Åë½Åü°è È®¸³, ½Ã½ºÅÛÀÇ ÅëÇÕ°ú °°Àº ¿ä¼Ò°¡ ÀÖ´Ù. ±×¸®°í, ÁÖ¹® ¹× °í°´°ü¸®, ¼ö¿ä¿¹Ãø, ±×¸®°í °æÁ¦ºÐ¼® µî°ú °°Àº °ÍÀ» ÅëÇÏ¿© °æ¿µÁö¿øÀ» Çϱ⵵ ÇÑ´Ù.
CIMÀº ¸Å¿ì ±¤¹üÀ§Çϱ⠶§¹®¿¡, ±â¾÷ÀÇ ÇüÆí°ú CIMÀÇ ¸ñÀû¿¡ µû¶ó, CIMÀ» ±¸¼ºÇÏ´Â ±â´ÉµéÀÌ Ãà¼ÒµÇ°Å³ª È®´ëµÇ¾î ¼¼ºÐµÇ±âµµ ÇÑ´Ù. CIMÀÇ ¿ä¼Òµµ ÀÌ·¯ÇÑ ±â´É¿¡ µû¶ó ´Þ¶óÁø´Ù.
 
»ý»ê/°Ë»ç Àåºñ Data¸¦ SECS¸¦ ÅëÇØ Host·Î ¼Û¼ö½Å
   
¹Ý¼Û ¼³ºñ, Port Stage, LOT Á¤º¸, °èÃøÁ¤º¸, Cassette Á¤º¸, ¾Ë¶÷ ¹× ¼³ºñ »óÅÂ(Status)¸¦ °ü¸®
   
Àç°ø(Glass)ÀÇ APD(Actual Processing Data) °á°ú ¼öÁý ¹× ó¸®
   
¾÷¹«ÀÇ Ç¥ÁØÈ­¸¦ Á¦°ø.(Flow¹× AddressMapÁ¦°ø)
   
Robot Motion ¹× Loader/Unloader µ¿½Ã Á¦¾î °¡´É
   
Auto Track In/Out
  ÇöÀå Àåºñ¸í
LCD ±¸¹Ì LG Philips LCD P2 Wet-Etch, BCL, ½Ä°¢Lifter, CleanLifter, Oven Transfer
P3 Wet-Etch, µÎ²² ÃøÁ¤±â, Dry Asher, Oven, Wet-Strip,
P3 °Ë»ç±â, CleanLifter, HP-CP, Loader,
P4 Initial Cleaner,ÀÌÀç±â, Loader
P5 Loader
P6 Sputter, ÀÌÀç±â, Loader
CF145 Etch&Strip
´ë¸¸ CPT G4,5 Wet-Etch, Wet-Strip
G6 Wet-Etch, Wet-Strip
  39´Ü °³Á¶
´ë¸¸ AUO G5 Initial Cleaner
G7(L7A) Initial Cleaner, PreDepo Cleaner
G7.5(L7B) Initial Cleaner, Wet-Strip
G8(L8A) Initial Cleaner, PreDepo Cleaner
G8.5(L8B) Initial Cleaner
´ë¸¸ CMO G7.5 Wet-Etch
´ë¸¸ Innolux G5 Wet-Strip
G6 Wet-Etch, Robot Á¦¾îPC, G-Mura Data PC, Rubbing Data PC,
°Ë»ç±â CIM, DataPC
´ë¸¸ Cando G4.5 Etch&Strip
Áß±¹ õ¸¶ G4.5 Wet-Etch
Áß±¹ õ¸¶ ¼ºµµ   Dense Unpacker, PPBOX, ODF
Áß±¹ IVO G5 Wet-Etch, Wet-Strip, PreDepo Cleaner, Initial Cleaner
Áß±¹ Truly G1 CoaterLINE °³Á¶
G2 Wet-Strip
Áß±¹ BOE-CD G4.5 Unpacker, Packer, ITO
G5 Indexer, Sheet Stocker
  G-Mura °Ë»ç±â, Visual ¸ñ½Ã °Ë»ç±â
Áß±¹ Century G4.5 Wet-Strip, , PreDepo Cleaner, G-Mura Data PC, Rubbing Data PC, Light Box Data PC
G5 Strip, °Ë»ç±â 3Á¾ 3´ë Repeat, G-Mura, Rubbing, Light Box
Áß±¹ Tianma-CD G4.5 Unpacker, ODF
Áß±¹ ÀÌ½Ì ±¸¾îµð¾È   ž籤 Wet Station CIM(+GUI)
ÅÁÁ¤ »ï¼ºÀüÀÚ T7 Etch&Strip
T7-1 ReworkÀåºñ °³Á¶
T7-2 Visual Inspection Convayor
  C5 ST04 VB(VC++) CIM °³Á¶
õ¾È »ï¼º SDI   Mask ¼¼Á¤±â, Mask ÃøÁ¤±â, ÇöóÁ ¼¼Á¤±â, Mask ÀÔ°í°Ë»ç±â, PreDepo Cleaner, WetEtch
ÆÄÁÖ LGD P8 Seal °Ë»ç±â Data PC, CELL Line Middle Server
P8E Seal °Ë»ç±â Data PC
OLED õ¾È »ï¼º SMD  

Plasma ¼¼Á¤±â, Wet-Etch, Mask ¼¼Á¤±â, PreDepo Cleaner,
Mask ÀÔ°í°Ë»ç±â, Mask ÃøÁ¤±â, InLine Cleaner, PreDepo Cleane,HCA Cleaner, Initial Cleaner, AMOLED Half Grinder, Mask¿ëÁ¢±â, Mask°Ë»ç ¸®Æä¾î±â

G4.5 Laminate CIM, Film Scriber CIM, HARF GRINDER
Flexible
G4.5
Film Scriber CIM
¹ÝµµÃ¼ ±¸¹Ì LG Siltron 200mm VIS, FCS, Slight Etcher, EPI Cleaner
»ï¼º ±âÈï ¹ÝµµÃ¼ R-Line
300mm
Wet Station(Mask ¼¼Á¤±â), PR Coater Inline
2 Line Solar Wafer Line CIM
»ï¼º È­¼º ¹ÝµµÃ¼

NRD-Line
300mm

Wet Station(Mask ¼¼Á¤±â)
ÇÏÀ̴нº 300mm SCRUBBER
SENSOR U-ITC   Evaporator
SOLAR ±âÈï »ï¼º   CVD
  Á¦Ç°¼³°è ±â´É
Á¦Ç°À» ¼³°èÇϱâ À§ÇÏ¿©¼­´Â Á¦Ç°À» ±¸¼ºÇÏ´Â ¸ðµç ǰ¸ñ¿¡ ´ëÇÑ ¼³°è¸¦ ÇÏ¿©¾ß ÇÑ´Ù. »Ó¸¸ ¾Æ´Ï¶ó, Á¦Ç°ÀÇ »ý»ê¿¡ ÇÊ¿äÇÑ °ø±¸³ª °íÁ¤±¸µµ ¼³°èÇÏ¿©¾ß ÇÑ´Ù. ¼³°è±â´É¿¡¼­´Â ÀÌ¿Í °ü·ÃµÈ ±âº»¼³°è, °øÇÐÀûºÐ¼®, »ó¼¼¼³°è µîÀ» ¼öÇàÇÑ´Ù. À̰ÍÀ» Áö¿øÇϱâ À§ÇÏ¿© CAD¸¦ ÀÌ¿ëÇÑ´Ù.
  »ý»ê ±â´É
»ý»ê±â´É¿¡¼­´Â, °¡°øÀ̳ª Á¶¸³À» ºñ·ÔÇÏ¿©, »ý»ê¿¡ ÇÊ¿äÇÑ ±â´ÉÀ» ¼öÇàÇÑ´Ù. °¡°øÀ» À§ÇÏ¿©, NC ÇÁ·Î±×·¥°ú °°Àº ÀÚµ¿»ý»êÀ» À§ÇÑ °¡°ø ÇÁ·Î±×·¥À» ÀÛ¼ºÇϰí, ÀÚµ¿Ã¢°í¸¦ ºñ·ÔÇÑ ÀÚÀçÀÇ º¸°üÀ̳ª ÀÚÀçÀÇ È帧À» Á¦¾îÇÏ´Â ÇÁ·Î±×·¥µµ ÀÛ¼ºÇÑ´Ù. ¶ÇÇÑ, °¢Á¾ ÀÚµ¿ÀåºñÀÇ °¡°ø, Á¶¸³, ¿î¹Ý¿¡ ´ëÇÑ ¿î¿µ ¹× º¸Á¸±â¼ú°ú Á¦Ç°ÀÇ Ç°ÁúÀ» º¸ÁõÇϱâ À§ÇÑ °Ë»ç ¹× ÃøÁ¤±â¼úµµ ÀÖ´Ù. GT¸¦ ºñ·ÔÇÏ¿© FMS, PC, CNC, ·Îº¿À» Æ÷ÇÔÇÑ CAMÀÌ »ý»ê±â´ÉÀÇ ÁÖ¿ä ±â¼úÀÌ µÈ´Ù.
  °èȹ ¹× °ü¸® ±â´É
°èȹ ¹× °ü¸®±â´ÉÀ¸·Î´Â, Á¦Ç°ÀÇ »ý»êÀ» À§ÇÑ °øÁ¤°èȹ, »ý»ê´É·Â°èȹ, ÀÚÀç¼Ò¿ä°èȹ, ÀÏÁ¤°èȹ, »ý»êÇöÀå ½Ã¹Ä·¹ÀÌ¼Ç µîÀ» ºñ·ÔÇÏ¿© ÀÛ¾÷Ç¥Áؼ³Á¤, ±¸¸Å°ü¸®, Àç°í°ü¸®, ǰÁú°ü¸®, ºÎÇϰü¸® µîÀÌ ÀÖ´Ù. CAPP¸¦ ºñ·ÔÇÏ¿©, MRP, JIT OPT(Optimized Production Technology) µî °¢Á¾ »ý»ê°èȹ ¹× °ü¸®±â¹ýµéÀÌ ÁַΠȰ¿ëµÈ´Ù.
  Á¤º¸°ü¸® ±â´É
Á¤º¸°ü¸® ±â´É¿¡´Â, µ¥ÀÌÅͺ£À̽ºÀÇ ±¸Ãà ¹× À¯Áö, ÄÄÇ»ÅÍ Åë½Åü°è È®¸³, ½Ã½ºÅÛÀÇ ÅëÇÕ°ú °°Àº ¿ä¼Ò°¡ ÀÖ´Ù. ±×¸®°í, ÁÖ¹® ¹× °í°´°ü¸®, ¼ö¿ä¿¹Ãø, ±×¸®°í °æÁ¦ºÐ¼® µî°ú °°Àº °ÍÀ» ÅëÇÏ¿© °æ¿µÁö¿øÀ» Çϱ⵵ ÇÑ´Ù.
CIMÀº ¸Å¿ì ±¤¹üÀ§Çϱ⠶§¹®¿¡, ±â¾÷ÀÇ ÇüÆí°ú CIMÀÇ ¸ñÀû¿¡ µû¶ó, CIMÀ» ±¸¼ºÇÏ´Â ±â´ÉµéÀÌ Ãà¼ÒµÇ°Å³ª È®´ëµÇ¾î ¼¼ºÐµÇ±âµµ ÇÑ´Ù. CIMÀÇ ¿ä¼Òµµ ÀÌ·¯ÇÑ ±â´É¿¡ µû¶ó ´Þ¶óÁø´Ù.
 
»ý»ê/°Ë»ç Àåºñ Data¸¦ SECS¸¦ ÅëÇØ Host·Î ¼Û¼ö½Å
   
¹Ý¼Û ¼³ºñ, Port Stage, LOT Á¤º¸, °èÃøÁ¤º¸, Cassette Á¤º¸, ¾Ë¶÷ ¹× ¼³ºñ »óÅÂ(Status)¸¦ °ü¸®
   
Àç°ø(Glass)ÀÇ APD(Actual Processing Data) °á°ú ¼öÁý ¹× ó¸®
   
¾÷¹«ÀÇ Ç¥ÁØÈ­¸¦ Á¦°ø.(Flow¹× AddressMapÁ¦°ø)
   
Robot Motion ¹× Loader/Unloader µ¿½Ã Á¦¾î °¡´É
   
Auto Track In/Out
  ÇöÀå Àåºñ¸í
LCD ±¸¹Ì LG Philips LCD P2 Wet-Etch, BCL, ½Ä°¢Lifter, CleanLifter, Oven Transfer
P3 Wet-Etch, µÎ²² ÃøÁ¤±â, Dry Asher, Oven, Wet-Strip,
P3 °Ë»ç±â, CleanLifter, HP-CP, Loader,
P4 Initial Cleaner,ÀÌÀç±â, Loader
P5 Loader
P6 Sputter, ÀÌÀç±â, Loader
CF145 Etch&Strip
´ë¸¸ CPT G4,5 Wet-Etch, Wet-Strip
G6 Wet-Etch, Wet-Strip
  39´Ü °³Á¶
´ë¸¸ AUO G5 Initial Cleaner
G7(L7A) Initial Cleaner, PreDepo Cleaner
G7.5(L7B) Initial Cleaner, Wet-Strip
G8(L8A) Initial Cleaner, PreDepo Cleaner
G8.5(L8B) Initial Cleaner
´ë¸¸ CMO G7.5 Wet-Etch
´ë¸¸ Innolux G5 Wet-Strip
G6 Wet-Etch, Robot Á¦¾îPC, G-Mura Data PC, Rubbing Data PC,
°Ë»ç±â CIM, DataPC
´ë¸¸ Cando G4.5 Etch&Strip
Áß±¹ õ¸¶ G4.5 Wet-Etch
Áß±¹ õ¸¶ ¼ºµµ   Dense Unpacker, PPBOX, ODF
Áß±¹ IVO G5 Wet-Etch, Wet-Strip, PreDepo Cleaner, Initial Cleaner
Áß±¹ Truly G1 CoaterLINE °³Á¶
G2 Wet-Strip
Áß±¹ BOE-CD G4.5 Unpacker, Packer, ITO
G5 Indexer, Sheet Stocker
  G-Mura °Ë»ç±â, Visual ¸ñ½Ã °Ë»ç±â
Áß±¹ Century G4.5 Wet-Strip, , PreDepo Cleaner, G-Mura Data PC, Rubbing Data PC, Light Box Data PC
G5 Strip, °Ë»ç±â 3Á¾ 3´ë Repeat, G-Mura, Rubbing, Light Box
Áß±¹ Tianma-CD G4.5 Unpacker, ODF
Áß±¹ ÀÌ½Ì ±¸¾îµð¾È   ž籤 Wet Station CIM(+GUI)
ÅÁÁ¤ »ï¼ºÀüÀÚ T7 Etch&Strip
T7-1 ReworkÀåºñ °³Á¶
T7-2 Visual Inspection Convayor
  C5 ST04 VB(VC++) CIM °³Á¶
õ¾È »ï¼º SDI   Mask ¼¼Á¤±â, Mask ÃøÁ¤±â, ÇöóÁ ¼¼Á¤±â, Mask ÀÔ°í°Ë»ç±â, PreDepo Cleaner, WetEtch
ÆÄÁÖ LGD P8 Seal °Ë»ç±â Data PC, CELL Line Middle Server
P8E Seal °Ë»ç±â Data PC
OLED õ¾È »ï¼º SMD  

Plasma ¼¼Á¤±â, Wet-Etch, Mask ¼¼Á¤±â, PreDepo Cleaner,
Mask ÀÔ°í°Ë»ç±â, Mask ÃøÁ¤±â, InLine Cleaner, PreDepo Cleane,HCA Cleaner, Initial Cleaner, AMOLED Half Grinder, Mask¿ëÁ¢±â, Mask°Ë»ç ¸®Æä¾î±â

G4.5 Laminate CIM, Film Scriber CIM, HARF GRINDER
Flexible
G4.5
Film Scriber CIM
¹ÝµµÃ¼ ±¸¹Ì LG Siltron 200mm VIS, FCS, Slight Etcher, EPI Cleaner
»ï¼º ±âÈï ¹ÝµµÃ¼ R-Line
300mm
Wet Station(Mask ¼¼Á¤±â), PR Coater Inline
2 Line Solar Wafer Line CIM
»ï¼º È­¼º ¹ÝµµÃ¼

NRD-Line
300mm

Wet Station(Mask ¼¼Á¤±â)
ÇÏÀ̴нº 300mm SCRUBBER
SENSOR U-ITC   Evaporator
SOLAR ±âÈï »ï¼º   CVD